| 摘要 |
PROBLEM TO BE SOLVED: To provide a dummy wafer that prevents thinning of a semiconductor wafer during cleaning or stabilizing operation of plasma etching system or plasma deposition system, and which has a long lifetime. SOLUTION: A wafer has a rare earth fluoride coating on a substrate as an outermost layer, the rare earth fluoride being selected from among lanthanoid fluoride, yttrium fluoride, and scandium fluoride. COPYRIGHT: (C)2009,JPO&INPIT |
