| 摘要 |
PROBLEM TO BE SOLVED: To provide a treatment system for preventing disturbance of air flow formed in a system. SOLUTION: When a wafer carriage means 54 of a first carriage unit 50 and a wafer carriage means 64 of a second carriage unit 60 move downward at the same time, the exhausting amount of exhausting fans 135 to 138 is increased under control of a controller 139, and a downflow of cleaning air is made strong. Then, a disturbance in air flow caused by the downward movement of the wafer carriage means 54 of the first carriage unit 50, and the wafer carriage means 64 of the second carriage unit 60 at the same time is absorbed by the strengthened downflow. |
