发明名称 ATMOSPHERE PLASMA SURFACE-TREATED AZO THIN FILM AND ITS MANUFACTURING METHOD
摘要 An atmospheric pressure plasma surface-treated AZO thin film and a manufacturing method thereof are provided to achieve simple and economic procedure by performing a plasma surface treatment under an atmospheric pressure. Reactive gas is supplied to a plasma generating device under an atmospheric pressure. The reactive gas is made from by adding oxygen to any one of argon, helium and nitrogen. Plasma is generated by applying AC power to the plasma generating device. ZnO thin film doped with Al is positioned into a plasma generating area. The surface of the AZO thin film is reformed.
申请公布号 KR20090077264(A) 申请公布日期 2009.07.15
申请号 KR20080003108 申请日期 2008.01.10
申请人 PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION 发明人 CHO, CHAE RYONG;JEONG, YE SUL;JEONG, SE YOUNG
分类号 H01L21/20;H01L21/3065 主分类号 H01L21/20
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