| 摘要 |
The invention is directed to elements used in high power laser lithographic systems operating at below 250 nm, and in particular to elements that have a coating of selected materials to extend lifetime of the elements; and to a method of preparing the extended lifetime elements. The invention is particularly directed to gratings and mirrors that are coated with silicon dioxide, aluminum oxide or fluorinated silicon dioxide. The coatings of the invention attain their extended life as a result of being deposited while being simultaneously bombarded with an energetic ion plasma.
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