POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME,申请号KR20020017975-传众专利搜索

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发明名称	POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
摘要
申请公布号	KR100907268(B1)	申请公布日期	2009.07.13
申请号	KR20020017975	申请日期	2002.04.02
申请人		发明人
分类号	G03F7/039;G03F7/004;H01L21/027;(IPC1-7):G03F7/039	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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