| 摘要 |
<p>An alignment overlay integration mark is provided, which enables to efficiently utilize the scribe line domain by providing key pattern which can implement the overlay measurement mark and the wafer alignment key. The alignment key(20) is arranged in the scribe line existing in the semiconductor chip circumference. The alignment key is used for the alignment between masks or mask and wafer. The pattern overlay accuracy is measured by the overlay measurement mark which is placed in the alignment key center. The overlay measurement mark is formed in the domain(24) in which the cross hair of the alignment key is formed. The overlay measurement mark is arranged in the laser scan of the alignment key within the range that does not produce the noise signal. The alignment key includes lots of the line pattern(26).</p> |
