| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning apparatus for cleaning a substrate or component of an immersion lithographic apparatus, and an immersion lithographic apparatus including an apparatus for cleaning one or more surfaces. <P>SOLUTION: The cleaning apparatus 42 may comprise a plasma radical source, a conduit, and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to a surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. The immersion lithographic apparatus may comprise a substrate table for supporting a substrate and a fluid confinement structure for confining immersion fluid between a projection system and the substrate table and/or the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
