| 摘要 |
PROBLEM TO BE SOLVED: To provide an upper electrode plate for plasma etching that produces no particle. SOLUTION: The upper electrode plate for plasma etching provided with a through pore 5 parallel to the thickness of the upper electrode plate 2 has a groove 15, composed of an upper wall surface 11 and a lower wall surface 11' extending from an opening end 8 to the deepest bottom portion 9, formed on an inner wall surface of the through pore 5, the groove 15 being a groove sectioned in a saw-tooth shape such that the lower wall surface 11' extending from the opening end 8 of the groove to the deepest bottom portion 9 tilts at an obtuse angle to a flow direction 13 of an etching gas. COPYRIGHT: (C)2009,JPO&INPIT
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