发明名称 SUBSTRATE TREATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To reduce a solvent concentration in exhaust gas and to reduce a burden on exhaust equipment by collecting a solvent in the exhaust gas. SOLUTION: The exhaust gas is mixed with deionized water by a static mixer 63 even if the vapor of high-concentration isopropyl alcohol is supplied through a solvent nozzles 17 into a chamber 11 surrounding a treating tank 1. Thus, since the gas, although including the vapor of isopropyl alcohol, is fed to a gas-liquid separator 53 with deionized water, the vapor of isopropyl alcohol is discharged with deionized water. As a result, it is possible to reduce the concentration of isopropyl alcohol in the exhaust gas from the gas-liquid separator 53. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009152395(A) 申请公布日期 2009.07.09
申请号 JP20070328927 申请日期 2007.12.20
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 AIHARA TOMOAKI
分类号 H01L21/304;B01D19/00;B01F3/04;B01F5/00;B08B3/04;F26B9/06;F26B21/00;F26B25/14;H01L21/306 主分类号 H01L21/304
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