发明名称 |
METAL STRUCTURE AND FABRICATION METHOD THEREOF |
摘要 |
A metal structure according to the present invention is unlikely to become brittle and has excellent hardness and creep resistance, characterized in that annealing has been applied at a temperature not more than the temperature at which crystals of the metal material start to become larger. This metal structure includes at least two kinds of metal material, and annealing can be applied at a temperature not more than the temperature at which crystals of the metal material start to become larger. For example, the present invention is advantageous in the manner of a microstructure for a contact probe. A fabricating method according to the present invention is a method of fabricating a metal structure unlikely to become brittle and having excellent hardness and creep resistance, characterized in that the step of applying annealing at a temperature not more than the temperature at which crystals of the metal material start to become larger is included.
|
申请公布号 |
US2009176027(A1) |
申请公布日期 |
2009.07.09 |
申请号 |
US20090399589 |
申请日期 |
2009.03.06 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
OKADA KAZUNORI;HIRATA YOSHIHIRO;INAZAWA SHINJI;SAKUTA MASAO;TANI YOSHIAKI;SAKATA TERUHISA |
分类号 |
B05D3/02;C21D9/00;C22F1/00;C22F1/10;C25D1/00;G01R1/067 |
主分类号 |
B05D3/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|