发明名称 Bonding pad structure and semiconductor device including the bonding pad structure
摘要 A bonding pad structure for a semiconductor device includes a first lower metal layer beneath a second upper metal layer in a bonding region of the device. The lower metal layer is formed such that the metal of the lower metal layer is absent from the bonding region. As a result, if damage occurs to the structure during procedures such as probing or bonding at the bonding region, the lower metal is not exposed to the environment. Oxidation of the lower metal layer by exposure to the environment is prevented, thus improving reliability of the device.
申请公布号 US2009176124(A1) 申请公布日期 2009.07.09
申请号 US20080291069 申请日期 2008.11.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HONG JONG-WON;KWAK MIN-KEUN;SEONG GEUM-JUNG;LEE JONG-MYEONG;CHOI GIL-HEYUN;HWANG HONG-KYU
分类号 H01L29/12;B32B15/01;B32B15/04 主分类号 H01L29/12
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