发明名称 |
OPTICAL MEMBER FOR EUVL AND SURFACE TREATMENT METHOD THEREOF |
摘要 |
<p>The present invention is to provide an optical member for Extreme Ultra-Violet Lithography which is used for a reflective type mask, a mirror, etc. for EUVL and has excellent flatness and surface roughness on an optical surface thereof and in which chamfer parts are inhibited from being chipped. The present invention relates to a surface treatment method of an optical member for EUVL, including applying Gas Cluster Ion Beam etching using a source gas containing at least one of fluorine and chlorine to an optical surface of an optical member for EUVL, wherein the optical member is made of a silica glass material having an OH concentration of 100 ppm or more, containing TiO2 and containing SiO2 as a major component.</p> |
申请公布号 |
WO2009084296(A1) |
申请公布日期 |
2009.07.09 |
申请号 |
WO2008JP68128 |
申请日期 |
2008.09.30 |
申请人 |
ASAHI GLASS CO., LTD.;KOIKE, AKIO;IWAHASHI, YASUTOMI;KIKUGAWA, SHINYA;OKAMURA, KENJI |
发明人 |
KOIKE, AKIO;IWAHASHI, YASUTOMI;KIKUGAWA, SHINYA;OKAMURA, KENJI |
分类号 |
C03C3/06;C03C15/00;C03C15/02;C03C23/00;G03F1/14;H01L21/027 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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