| 摘要 |
An apparatus for manufacturing a semiconductor or liquid crystal is provided with a reaction chamber housing a ceramic holder with an embedded resistive heating element, and a cylindrical support member one end of which supports the ceramic holder and the other end of which side is fixed to the reaction chamber. One end of the cylindrical support member is hermetically bonded to the ceramic holder; and a partition plate and sealing material hermetically seal the other end of which side. Embodiments include partitioning the space within the cylindrical support member with the ceramic holder, and the partition plate and depressurizing to vacuum or to a reduced pressure atmosphere of an inert gas. Advantageously the cylindrical support member can easily be hermetically sealed, corrosion and oxidation of electrode terminals exposed on the rear surface of the ceramic holder prevented, the thermal uniformity and thermal efficiency of the holder improved, and the length of the cylindrical support member reduced, thereby reducing the size of the reaction chamber. |
