发明名称 |
SYSTEMS AND METHODS FOR DYNAMIC ALIGNMENT BEAM CALIBRATION |
摘要 |
<p>A method for performing DA (Dynamic Alignment) beam calibration in a plasma processing system is provided. The method including acquiring a positional difference, the positional difference is acquired using an optical imaging approach. The optical imaging approach comprising of positioning the wafer on the end effector, taking a still image of the wafer on the end effector, processing the still image to ascertain the center of the wafer and an end effector-defined center defined by the end effector, and determining the positional difference between the center of the wafer and the end effector-defined center defined by the end effector. The method also includes centering a wafer with respect to an end effector by compensating for a positional difference between the wafer and the end effector with robot movement compensation. The method including moving the wafer and the end effector through DA beams associated with a plasma processing module. The method also includes obtaining a reference DA beam pattern by recording a break-and-make pattern of the DA beams. The break-and-make pattern occurring as the wafer and the end effector move through the DA beams.</p> |
申请公布号 |
WO2009086109(A2) |
申请公布日期 |
2009.07.09 |
申请号 |
WO2008US87684 |
申请日期 |
2008.12.19 |
申请人 |
LAM RESEARCH CORPORATION;ALLEN-BLANCHETTE, CHRISTINE;RODNICK, MATT |
发明人 |
ALLEN-BLANCHETTE, CHRISTINE;RODNICK, MATT |
分类号 |
H01L21/68;H01L21/66 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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