发明名称 DEPOSITION PROCESS
摘要 <p>The deposition process comprises the following phases: placing a substratum to be covered in a deposition environment in which the deposition pressure is lower than the atmospheric pressure; applying a coating of metal material in the nebulized state onto said substratum to be covered, so as to obtain a covered substratum, being provided that said substratum to be covered is purified.</p>
申请公布号 CA2710371(A1) 申请公布日期 2009.07.09
申请号 CA20082710371 申请日期 2008.12.18
申请人 GIRARDELLO, GIANPAOLO 发明人 GIRARDELLO, GIANPAOLO
分类号 C23C14/02;C23C14/20 主分类号 C23C14/02
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