发明名称 PLASMA TREATMENT APPARATUS, HEATING DEVICE FOR THE PLASMA TREATMENT APPARATUS, AND PLASMA TREATMENT METHOD
摘要 <p>Provided is a plasma treatment apparatus which is relatively low at a production cost and excellent in heating efficiency and cooling efficiency. An anode electrode (7) is equipped therein with tubular heating units (31) for heating a treating object (including a tray (5) and a substrate (6)) to be treated with plasma. The tubular heating units (31) are composed of seven tubular heaters (in this example, seed heaters) (31), which are U-shaped in a top plan view and adjacent in parallel to each other. The anode electrode (7) is further equipped therein with tubular cooling units (32) for cooling the anode electrode (7). The cooling units (32) are composed of seven cooling tubes (in this example, cooling nitrogen gas conduits) (32), which are U-shaped in a top plan view and adjacent in parallel to each other along the outer sides of the individual tubular heaters (31), and which can exhaust the cooling gas introduced thereinto, after passed, to the outside.</p>
申请公布号 WO2009084486(A1) 申请公布日期 2009.07.09
申请号 WO2008JP73224 申请日期 2008.12.19
申请人 SHARP KABUSHIKI KAISHA;KISHIMOTO, KATSUSHI;FUKUOKA, YUSUKE 发明人 KISHIMOTO, KATSUSHI;FUKUOKA, YUSUKE
分类号 H05H1/46;H01L21/205 主分类号 H05H1/46
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