| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of preventing distortion or loss of a photoresist pattern used as an etching barrier in a process of etching an organic bottom anti-reflective coating. <P>SOLUTION: The method of manufacturing a semiconductor device includes a step of forming an organic bottom anti-reflective coating over an etch target layer, a step of forming a photoresist pattern over the organic bottom anti-reflective coating, and a step of etching the organic bottom anti-reflective coating using a sulfur-containing gas. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
