| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle for lithography, in which a pellicle frame can be formed with high purity and high strength while reducing dust generating from the pellicle frame. <P>SOLUTION: The pellicle for lithography comprises at least a pellicle film, a pellicle frame on which the pellicle film is stretched, and a tacky layer provided on the other end face of the pellicle frame, wherein the pellicle frame is made of a silicon single crystal. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
