MICROELECTROMECHANICAL COMPONENT AND PRODUCTION METHOD

摘要

The invention relates to a sacrificial layer provided under a micromechanical layer (2), isotropically etched back to residual portions so that spacers (4) are formed on the top side of a carrier (1) in an intermediate space (3), said spacers comprising a shape tapering toward the micromechanical layer. In this manner, after exposing the micromechanical layer by etching, the micromechanical layer is prevented from adhering to the top side of the carrier.