发明名称 IMAGING OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY COMPRISING AN IMAGING OPTICAL SYSTEM OF THIS TYPE
摘要 An imaging optical system (7) with a plurality of mirrors (M1 to M10) images an object field (4) in an object plane (5) into an image field (8) in an image plane (9). In the light path between non-obscured mirrors (M1 to M8), imaging rays (15) pass through at least one multiple pass-through region between spaced-apart planes which are arranged parallel to the object plane (5) and/or parallel to the image plane (9). The imaging optical system has at least one pupil plane (76, 77, 78, 17). Said pupil plane (76, 77, 78, 17) is arranged outside the multiple pass-through region between the non- obscured mirrors (M1 to M6). This results in an imaging optical system which provides for an easier correction of image errors. Other types of imaging optical systems with a correspondingly easier correction of image errors are presented as well.
申请公布号 WO2009053023(A3) 申请公布日期 2009.07.09
申请号 WO2008EP08886 申请日期 2008.10.21
申请人 CARL ZEISS SMT AG;MANN, HANS-JUERGEN 发明人 MANN, HANS-JUERGEN
分类号 G02B17/06;G03F7/20 主分类号 G02B17/06
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