发明名称 NONVOLATILE STORAGE ELEMENT, ITS MANUFACTURING METHOD, AND NONVOLATILE SEMICONDUCTOR DEVICE USING THE NONVOLATILE STORAGE ELEMENT
摘要 <p>A nonvolatile storage element is provided with a first electrode layer (103), a second electrode layer (107), and a resistance change layer (106) that is interposed between the first electrode layer (103) and the second electrode layer (107) and has a resistance value which reversibly changes on the basis of electrical signals given between both electrodes (103) and (107). This resistance change layer (106) has a laminated structure in which a first tantalum-containing layer having a composition represented by TaOx (wherein, 0<=x<2.5) and a second tantalum-containing layer having a composition represented by TaOy (wherein, x<y) are laminated.</p>
申请公布号 KR20090075777(A) 申请公布日期 2009.07.09
申请号 KR20087031227 申请日期 2008.03.26
申请人 PANASONIC CORPORATION 发明人 KANZAWA YOSHIHIKO;KATAYAMA KOJI;FUJII SATORU;MURAOKA SHUNSAKU;OSANO KOICHI;MITANI SATORU;MIYANAGA RYOKO;TAKAGI TAKESHI;SHIMAKAWA KAZUHIKO
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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