| 摘要 |
A gas-barrier film comprising an organic layer and an inorganic layer on a substrate film, wherein the organic layer is formed by vacuum vapor deposition of a composition containing a radical-polymerizable monomer and a polymerization initiator, followed by curing the composition, the polymerization initiator being liquid at 30° C. under one atmosphere and/or having a melting point of not higher than 30° C. The gas-barrier film has a low water vapor permeability.
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