发明名称 MEMORY CELL SUITABLE FOR DRAM MEMORY
摘要 The present invention relates to a memory cell with a memory capacitor (110) on an active semiconductor region (104), the memory capacitor having a first capacitor- electrode layer, which, in a cross-sectional view of the memory cell, has first and second electrode-layer sections that extend on the active semiconductor region in parallel to the surface of the active semiconductor region at a vertical distance to each other and that are electrically connected by a third electrode-layer section extending vertically, that is, perpendicular to the surface of the active semiconductor region. A control transistor (112) is connected with a conductive second capacitor electrode layer that extends between the first and second electrode-layer sections and is electrically isolated from them by an isolation layer (116). Achieved advantages comprise a high manufacturing yield can, reduced fabrication cost and reduced risk of junction leakage by a small area required for the memory cell.
申请公布号 WO2009083882(A2) 申请公布日期 2009.07.09
申请号 WO2008IB55414 申请日期 2008.12.18
申请人 NXP B.V.;PUGET, SOPHIE;MAZOYER, PASCALE, L., A. 发明人 PUGET, SOPHIE;MAZOYER, PASCALE, L., A.
分类号 H01L21/8242;H01L21/02;H01L27/02;H01L27/07;H01L27/108 主分类号 H01L21/8242
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