| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter having an overcoat layer, a photospacer and a sub photospacer, with which production cost is made low and productivity is improved. <P>SOLUTION: A photosensitive curable resin is collectively applied onto a color filter substrate. Thereafter, a flat pattern is collectively exposed, drawn and developed by using a photomask having at least three areas different from one another such as an opening part, a gray tone part and a half tone part. Thus, the overcoat layer, photospacer and sub photospacer are not pattern-formed separately and successively, but are collectively formed, thereby the number of processes being reduced. <P>COPYRIGHT: (C)2009,JPO&INPIT |
