发明名称 |
Illumination device for microlithographic projection exposure system for manufacturing e.g. LCD, has manipulator in connection with light mixing bar producing locally varying contribution for polarization distribution in reticle plane |
摘要 |
<p>The device (101) has a light mixing bar (109) causing total reflection of light passed through the light mixing bar when operating the device. A polarization manipulator (113) is arranged before the light mixing bar in a light propagation direction. The manipulator causes asymmetrical manipulation of polarization distribution of the light passed through the manipulator with respect to an optical axis (OA) during operation of the device. The manipulator in connection with the light mixing bar produces a locally varying contribution for the polarization distribution in a reticle plane. Independent claims are also included for the following: (1) a method for manipulation of polarization distribution in an illumination device (2) a method for microlithographic manufacturing of microstructure components.</p> |
申请公布号 |
DE102008003289(A1) |
申请公布日期 |
2009.07.09 |
申请号 |
DE20081003289 |
申请日期 |
2008.01.05 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
KIRCH, MARC;REICHERTER, MARCUS;FIOLKA, DAMIAN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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