| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask in which dispersion of line width is accurately corrected, and the line width can be adjusted to fluctuation of an exposing device, a method and device for correcting the line width of a photomask, and an electronic device using the same. <P>SOLUTION: The photomask includes a substrate, and a light shielding film provided on a major surface of the substrate, having a first transmittance in a first area having a first mask line width and having a second transmittance different from the first transmittance in a second area having a second mask line width different from the first mask line width. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
