发明名称 |
NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME |
摘要 |
A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
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申请公布号 |
US2009176337(A1) |
申请公布日期 |
2009.07.09 |
申请号 |
US20080345169 |
申请日期 |
2008.12.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD.;TECHNO SEMICHEM CO., LTD. |
发明人 |
KANG HOON;KIM JAE-SUNG;JUNG YANG-HO;LEE HI-KUK;KAMEYAMA YASUHIRO;MIZUHO YUUJI;KIM JONG-CHEOL;CHOI SE-JIN |
分类号 |
H01L21/336;G03F7/004 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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