Semiconductor device

摘要

The invention provides a semiconductor device that solves a problem of reflection of a pattern of a wiring (9) formed on a back surface of a semiconductor substrate (2) on an output image. A reflection layer (8) is formed between a light receiving element (1) and a wiring layer (9), that reflects an infrared ray toward a light receiving element (1) the without transmitting it to the wiring layer (9), the infrared ray entering from a light transparent substrate (6) toward the wiring layer (9) through a semiconductor substrate (2). The reflection layer (8) is formed at least in a region under the light receiving element (1) uniformly or only under the light receiving element (1). Alternatively, an anti-reflection layer having a function of absorbing the entering infrared ray to prevent transmission thereof may be formed instead of the reflection layer.