发明名称 POWER SUPPLY CIRCUIT FOR PLASMA GENERATION, PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS AND PLASMA-PROCESSED OBJECT
摘要 A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus, a plasma generating apparatus, a plasma processing apparatus which can process a large quantity of objects to be processed at a low cost by using the plasma generating apparatus, and plasma processed objects having target quantities are realized. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil even when the electric discharge of capacitor progresses, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by common use of the alternating high voltage generating circuit.
申请公布号 EP1748687(A4) 申请公布日期 2009.07.08
申请号 EP20050710329 申请日期 2005.02.17
申请人 DAIKEN CHEMICAL CO., LTD;TAKIKAWA, HIROFUMI 发明人 TAKIKAWA, HIROFUMI;NISHIMURA, YOSHIMI;HARADA, AKIO
分类号 H05H1/36;H05H1/46;H01L21/304;H05H1/30 主分类号 H05H1/36
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