发明名称 Method of forming a high breakdown voltage diode
摘要 A multiple layer overvoltage protection device is provided. The method begins by providing a substrate having a first impurity concentration of a first conductivity type to define a mid-region layer. A dopant of a second conductivity type is introduced into the substrate with a second impurity concentration less than the first impurity concentration. An upper base region having a second type of conductivity is formed on the upper surface of the mid-region layer. A lower base region layer having a second type of conductivity is formed on a lower surface of the mid-region layer. A first emitter region having a first type of conductivity is formed on a surface of the upper base region layer. A first metal contact is coupled to the upper base region layer and a second metal contact is coupled to the lower base region layer.
申请公布号 EP2076926(A2) 申请公布日期 2009.07.08
申请号 EP20070838194 申请日期 2007.09.14
申请人 VISHAY GENERAL SEMICONDUCTOR LLC 发明人 KAO, LUNG-CHING;KUNG, PU-JU
分类号 H01L29/87 主分类号 H01L29/87
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