发明名称 |
A method and a computer program for performing decomposition of a pattern for use in a DPT process and a mask |
摘要 |
A method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns. The method includes the steps of: (a) defining a region of influence which indicates the minimum necessary space between features to be imaged; (b) selecting a vertex associated with a feature of the target pattern; (c) determining if an edge of another feature is within the region of influence with respect to the vertex; and (d) splitting the another feature into two polygons if the edge of another feature is within the region of influence. |
申请公布号 |
EP1925978(A3) |
申请公布日期 |
2009.07.08 |
申请号 |
EP20070254461 |
申请日期 |
2007.11.14 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
SOCHA, ROBERT JOHN |
分类号 |
G03F1/00;G03F1/14;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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