发明名称 COMPOSITION FOR FORMING A SILICON FILM AND METHOD FOR FORMING A SILICON FILM
摘要 <p>There are provided a silicon-film-forming composition containing silicon particles and a dispersion medium and a method for forming a silicon film by forming a coating film of the silicon-film-forming composition on a substrate and subjecting the coating film to instantaneous fusion, a heat treatment or a light treatment. According to the composition and the method, a polysilicon film with a desired thickness which may be used as a silicon film for a solar battery can be formed efficiently and easily. <IMAGE></p>
申请公布号 EP1551057(B1) 申请公布日期 2009.07.08
申请号 EP20030792692 申请日期 2003.08.15
申请人 JSR CORPORATION 发明人 MATSUKI, YASUO;IWASAWA, HARUO;KATO, HITOSHI
分类号 H01L21/208;C23C24/10;C23C26/02;H01L31/09;H01L31/18 主分类号 H01L21/208
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