发明名称 Semiconductor saturable absorber and fabrication method thereof
摘要 A semiconductor saturable absorber and the fabrication method thereof are provided. The semiconductor saturable absorber includes a Fe-doped InP substrate, a periodic unit comprising an AlGaInAs QW formed on the Fe-doped InP substrate and an InAlAs barrier layer formed on one side of the AlGaInAs QW, and another InAlAs barrier layer formed on the other side of the AlGaInAs QW. Each of the InAlAs barrier layers has a width being a half-wavelength of a light emitted by the AlGaInAs QW.
申请公布号 US7558299(B2) 申请公布日期 2009.07.07
申请号 US20080971401 申请日期 2008.01.09
申请人 HUANG KAI-FENG;CHEN YUNG-FU 发明人 HUANG KAI-FENG;CHEN YUNG-FU
分类号 H01S3/113 主分类号 H01S3/113
代理机构 代理人
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