| 摘要 |
<p>A method for repairing a defect in a photo mask is provided to use a photo mask having a normal die as a mask for another photo mask having a defective die, thereby transforming the defective die to the normal die. A method for repairing a defect in a photo mask comprises the following steps. A first photo mask(100) and a second photo mask(115) with mask patterns are prepared. The first and second photo mask are inspected to detect normal dies and defective dies. A first photoresist layer pattern capable of selectively exposing the defective dies is formed on the second photo mask from which the defective dies are detected. The mask pattern is etched and removed by the first photoresist layer pattern serving as an etching mask for etching the mask pattern of the exposed defective die. A pattern layer is formed on the exposed substrate of the defective die. A second photoresist layer pattern(230) is formed on the pattern layer.</p> |
