发明名称 |
Polishing pad, use thereof and method for manufacturing the same |
摘要 |
The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.
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申请公布号 |
US7556555(B2) |
申请公布日期 |
2009.07.07 |
申请号 |
US20070706189 |
申请日期 |
2007.02.15 |
申请人 |
SAN FANG CHEMICAL INDUSTRY CO., LTD. |
发明人 |
FENG CHUNG-CHIH;YAO I-PENG;WANG LYANG-GUNG;HUNG YUNG-CHANG |
分类号 |
B24B7/22;B24D99/00;B24D3/28 |
主分类号 |
B24B7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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