GAS INJECTION APPARATUS AND FILM DEPOSITING SYSTEM HAVING THE SAME

摘要

A gas injection device and a film deposition system having the same are provided to improve the evaporation efficiency by exposing at least a part of the heating element to the evaporation space so as to provide radiant heat directly. A gas injection device comprises a deposition material transfer part transferring a material to be deposited, an injector unit(320) including a deposition material inflow space, an evaporation space for vaporizing the deposition material put in, and an injection space for spraying the vaporized deposition material, and a heating element(330) which is exposed at least partly to the evaporation space of the injector unit.