发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND COLOR FILTER USING THE SAME |
摘要 |
A photoresist resin composition for a color filter, and a color filter manufactured by using it are provided to prevent the remaining of residue on the nonexposure part and to form the ultra-fine pixel. A photoresist resin composition for a color filter comprises an alkali soluble resin; a polymerizable monomer; a polymerization initiator; a pigment; a dispersant; and a solvent, wherein the dispersant is an amino group-containing maleic acid copolymer having a urethane group and a long chain branched group. Preferably the dispersant is formed by the combination of the structural units represented by the formula 1 and the formula 2. |
申请公布号 |
KR20090073926(A) |
申请公布日期 |
2009.07.03 |
申请号 |
KR20070142001 |
申请日期 |
2007.12.31 |
申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
KIM, JAE HYUN;LEE, KIL SUNG;LEE, CHANG MIN;JEONG, EUI JUNE |
分类号 |
G03F7/028 |
主分类号 |
G03F7/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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