发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND COLOR FILTER USING THE SAME
摘要 A photoresist resin composition for a color filter, and a color filter manufactured by using it are provided to prevent the remaining of residue on the nonexposure part and to form the ultra-fine pixel. A photoresist resin composition for a color filter comprises an alkali soluble resin; a polymerizable monomer; a polymerization initiator; a pigment; a dispersant; and a solvent, wherein the dispersant is an amino group-containing maleic acid copolymer having a urethane group and a long chain branched group. Preferably the dispersant is formed by the combination of the structural units represented by the formula 1 and the formula 2.
申请公布号 KR20090073926(A) 申请公布日期 2009.07.03
申请号 KR20070142001 申请日期 2007.12.31
申请人 CHEIL INDUSTRIES INC. 发明人 KIM, JAE HYUN;LEE, KIL SUNG;LEE, CHANG MIN;JEONG, EUI JUNE
分类号 G03F7/028 主分类号 G03F7/028
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