发明名称 STRUCTURE OF CONTACT A IMAGE SENSOR
摘要 A contact structure of an image sensor is provided to secure the contact etch margin of the image sensor by forming the contact of the different size on the active area of the pixel region. A plurality of contacts is formed on the active region of the pixel region. Adjacent domain contacts(21,22,23a,24a) formed on the poly are formed with different size. The contact formed on the poly is more formed smaller than the contact formed in the other part except the poly. The contact formed on the poly is the non-silicide contact.
申请公布号 KR20090073520(A) 申请公布日期 2009.07.03
申请号 KR20070141486 申请日期 2007.12.31
申请人 DONGBU HITEK CO., LTD. 发明人 LEE, CHANG EUN
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
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