GAS INJECTION APPARATUS AND APPARATUS DEPOSITING THIN FILM HAVING THE SAME

摘要

A gas injection apparatus and a thin film depositing apparatus having the same are provided to prevent a foreign material like a particle or raw material which is not evaporated from being injected to the substrate directly by forming one end of a gas injection path in an inner wall of an injecting plate where the path is installed. A thin film depositing device includes a chamber(100), a gas injection device(200), and a substrate support unit(300). The gas injection device includes a heating plate(210) and an injecting plate(220). A rotation axis rotates the heating plate and the injecting plate around a vertical axis. The heating plate evaporates the raw material. The injecting plate includes an inner space and a gas injection path. The inner space receives the raw material supplied from the heating plate. A gas injection path is extendedly formed to pass through the lower surface by being connected to the inner space.