发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device in which a charge storage layer is separated under a gate electrode, and to provide a method of easily manufacturing the same. SOLUTION: The semiconductor device comprises: two groove parts 12 provided on a semiconductor substrate 10; the charge storage layer 24 composed of insulators provided on the respective side faces of the two groove parts 12 and separated at the bottom surfaces of the groove parts 12; and a bit line 14 provided on the semiconductor substrate 10 at the respective bottom surfaces of the two groove parts 12. Of the semiconductor substrate 10, a channel region 30 is formed from one side face of the two groove parts 12 through the upper surface of a projected part 13 provided between the two groove parts 12 to the other side face of the two groove parts 12. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009147237(A) 申请公布日期 2009.07.02
申请号 JP20070325291 申请日期 2007.12.17
申请人 SPANSION LLC 发明人 UTSUNO ITSUHIRO
分类号 H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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