| 发明名称 |
CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION |
| 摘要 |
A chemical mechanical polishing aqueous dispersion includes (A) abrasive grains having a pore volume of 0.14 ml/g or more, and (B) a dispersion medium.
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| 申请公布号 |
US2009165395(A1) |
申请公布日期 |
2009.07.02 |
| 申请号 |
US20060097361 |
申请日期 |
2006.12.04 |
| 申请人 |
JSR CORPORATION |
发明人 |
IKEDA NORIHIKO;UENO TOMIKAZU |
| 分类号 |
C09K3/14 |
主分类号 |
C09K3/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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