METHOD FOR MANUFACTURING IAMGE SENSOR

摘要

In a method for manufacturing an image sensor, an interlayer insulating layer including a metal line is formed on a semiconductor substrate. A lower electrode layer is formed on the metal line such that the lower electrode is connected with the metal line. A photoresist pattern corresponding to the metal line is formed on the lower electrode layer. The lower electrode layer is etched using the photoresist pattern to form a lower electrode connected with the metal line. The photoresist pattern is stripped using a solvent containing fluorine.