发明名称 TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY
摘要 Techniques for measuring and controlling ion beam angle and density uniformity are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for measuring and controlling ion beam angle and density uniformity. The apparatus may include a measuring assembly having an opening, a cup, and at least one collector at the rear of the cup. The apparatus may further include an actuator to move the measuring assembly along an actuation path to scan an ion beam to measure and control ion beam uniformity.
申请公布号 WO2009064871(A3) 申请公布日期 2009.07.02
申请号 WO2008US83386 申请日期 2008.11.13
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;KELLERMAN, PETER, L.;PURSER, KENNETH;RADOVANOV, SVETLANA;SINCLAIR, FRANK;SLOCUM, JOHN;BENVENISTE, VICTOR, M. 发明人 KELLERMAN, PETER, L.;PURSER, KENNETH;RADOVANOV, SVETLANA;SINCLAIR, FRANK;SLOCUM, JOHN;BENVENISTE, VICTOR, M.
分类号 H01L21/265;H01L21/66 主分类号 H01L21/265
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