| 摘要 |
<p>Provided are a process monitoring apparatus and method. The process monitoring apparatus includes a process chamber in which a process is performed, a probe assembly disposed on the process chamber, and comprising a probe electrode, a plasma generator generating plasma around the probe assembly, and a drive processor applying an alternating current (AC) voltage having at least 2 fundamental frequencies to the probe assembly, and extracting process monitoring parameters.</p> |
| 申请人 |
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE;CHUNG, CHIN-WOOK;LEE, MINHYONG;JANG, SUNG-HO;CHOI, IK-JIN;KIM, JUNG-HYUNG;SHIN, YONG-HYEON |
发明人 |
CHUNG, CHIN-WOOK;LEE, MINHYONG;JANG, SUNG-HO;CHOI, IK-JIN;KIM, JUNG-HYUNG;SHIN, YONG-HYEON |
