OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME

摘要

Disclosed is a field effect transistor having a semiconductor layer which is composed of a complex oxide containing element In, element Zn, and one or more elements X selected from the group consisting of Zr, Hf, Ge, Si, Ti, Mn, W, Mo, V, Cu, Ni, Co, Fe, Cr, Nb, Al, B, Sc, Y and lanthanoids at the following atomic ratios (1)-(3). In/(In + Zn) = 0.2-0.8 (1) In/(In + X) = 0.29-0.99 (2) Zn/(X + Zn) = 0.29-0.99 (3)