SURFACE ANTIREFLECTION FILM FORMING COMPOSITION AND PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To reduce the application amount of a surface antireflection film forming composition, accordingly to reduce the amount of waste liquid, whereby an adverse effect on the environment is avoided and cost in resist pattern formation is reduced.

SOLUTION: The surface antireflection film forming composition comprises at least one fluorine-containing compound, a quaternary ammonium compound represented by general formula (1) and, optionally, a water-soluble polymer, an acid, a surfactant and an aqueous solvent, wherein at least one of R1-R4represents an alkanol group, the others represent hydrogen or a 1-10C alkyl group, and X-represents a hydroxyl group, a halide ion or a sulfate ion.

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