| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask for film deposition having very excellent practicality, which excellently and closely fitted to a substrate, and is capable of realizing the film deposition with the excellent film deposition pattern accuracy, and a mask closely fitting method. <P>SOLUTION: The mask for film deposition comprises a mask body 1 having an aperture pattern permitting the passage of a film deposition material, and a holding frame 2 for holding the mask body 1, and a substrate 6 on which the film deposition material is deposited via the aperture pattern is laminated on the mask. The holding frame 2 has a pair of holding parts 4, arranged along a pair of ridge parts 3 opposite to each other out of four ridges of the mask body 1, for holding the pair of ridge parts 3, respectively, so that the mask body 1 is held only by the pair of holding parts 4. The pair of ridge parts 3 are fixed to the pair of holding parts 4 so that the mask body 1 is deflected by its self weight between the pair of ridge parts 3 held by the pair of holding parts 4, and the deflection is changed in the opposite direction of the pair of ridge parts 3. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
