| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a semiconductor device and a semiconductor manufacturing apparatus which improve productivity and provide fine characteristics. SOLUTION: The manufacturing method for the semiconductor device includes a step of forming an amorphous semiconductor film 15 on an insulating substrate 1, a step of dehydrogenating the amorphous semiconductor film 15, a step of forming a protective layer 5 on the dehydrogenated amorphous semiconductor film 15, and a step of transforming the amorphous semiconductor film 15 into a polycrystal film via the protective layer 5. The insulating substrate 1 is kept in vacuum from the formation of the amorphous semiconductor film 15 to the formation of the protective layer 5. COPYRIGHT: (C)2009,JPO&INPIT
|
