| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that effectively removes particulates sticking on an original plate. <P>SOLUTION: The exposure apparatus according to the invention exposes the pattern of an original plate to a substrate through a projection optical system in a vacuum environment, and also has a cleaning device which cleans the original plate. The cleaning device has an irradiation means of irradiating the laser-irradiating region of the original plate with laser light, a stage to move the original plate, a first scanning means of moving the laser-irradiated region in a direction orthogonal to a laser incident direction using one of the irradiation means and the stage when a direction in which the laser light is projected orthogonally on the original plate is defined as the laser incident direction, and a second scanning means of moving the laser-irradiating region in the same direction as the laser incident direction using the other of the irradiation means and the stage. <P>COPYRIGHT: (C)2009,JPO&INPIT |
