发明名称 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To measure the position of a moving body which moves in a two dimensional plane, in a stable manner and with high precision, using two position measurement systems having different measurement areas. <P>SOLUTION: Two X heads (EX<SB>1</SB>, EX<SB>2</SB>) and one Y head (EY) are mounted on a stage (WST2), and an X scale (SX<SB>2</SB>) and a Y scale (SY<SB>2</SB>) corresponding to these heads are arranged facing the stage (WST2) so that the scales may connect an exposure area and an alignment area. The stage (WST2) is made to move back and forth between the exposure area and the alignment area along a path where the scales (SX<SB>2</SB>, SY<SB>2</SB>) are set, while performing position measurement using three encoder heads (EX<SB>1</SB>, EX<SB>2</SB>, EY). Accordingly, a switching process between XZ interferometers (116, 117) and between XZ interferometers (126, 127) will not be necessary, and also it becomes possible to measure the position of the stage, which moves in the XY plane using two position measurement systems having different measurement areas. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009147342(A) 申请公布日期 2009.07.02
申请号 JP20080316405 申请日期 2008.12.12
申请人 NIKON CORP 发明人 SHIBAZAKI YUICHI
分类号 H01L21/027;G01B11/00;G03F7/20;H01L21/68 主分类号 H01L21/027
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